Silicon wafer 3inch P/N Type 1~10Ω Oxide Layer Semiconductor Substrate - Soka Technology
Silicon wafer 3inch P/N Type 1~10Ω Oxide Layer Semiconductor Substrate - Soka Technology
Silicon wafer 3inch P/N Type 1~10Ω Oxide Layer Semiconductor Substrate - Soka Technology

SOKA TECHNOLOGY

Silicon wafer 3inch P/N Type 1~10Ω Oxide Layer Semiconductor Substrate

Sale priceCHF 27.00
Specification:N(100) Oxide Layer 100nm
Number Of Items:1 Item
Quantity:
♦️High-quality silicon wafer for Research and Experiment.
♦️Provide small quantities, special specifications products, and customized services.
♦️Global shipping, secure payment, large inventory.
♦️Minimum delivery time within 1 week. Shipped by FedEx, DHL,UPS, etc.
Silicon Wafer Specification:
  • Size: 3inch;
  • Method: CZ;
  • Type: N;
  • Dopant: P;
  • Orientation:100;
  • Resistivity: 1~10Ω;
  • Thickness: 500um±25;
  • Oxide layer: 100nm(both sides);
  • TTV<10um ;
  • Surface: polished;
  • Backside: etched;
  • Packing: silicon wafer case;